Showing posts with label Christopher Rathje. Show all posts
Showing posts with label Christopher Rathje. Show all posts

Wednesday, February 22, 2017

Abstract-Ultrafast terahertz control of extreme tunnel currents through single atoms on a silicon surface



http://www.nature.com/nphys/journal/vaop/ncurrent/full/nphys4047.html



Ultrafast control of current on the atomic scale is essential for future innovations in nanoelectronics. Extremely localized transient electric fields on the nanoscale can be achieved by coupling picosecond duration terahertz pulses to metallic nanostructures. Here, we demonstrate terahertz scanning tunnelling microscopy (THz-STM) in ultrahigh vacuum as a new platform for exploring ultrafast non-equilibrium tunnelling dynamics with atomic precision. Extreme terahertz-pulse-driven tunnel currents up to 107 times larger than steady-state currents in conventional STM are used to image individual atoms on a silicon surface with 0.3nm spatial resolution. At terahertz frequencies, the metallic-like Si(111)-(7 × 7) surface is unable to screen the electric field from the bulk, resulting in a terahertz tunnel conductance that is fundamentally different than that of the steady state. Ultrafast terahertz-induced band bending and non-equilibrium charging of surface states opens new conduction pathways to the bulk, enabling extreme transient tunnel currents to flow between the tip and sample.

Wednesday, October 12, 2016

Abstract-Ultrafast Terahertz Scanning Tunneling Microscopy with Atomic Resolution


Vedran Jelic, Krzysztof Iwaszczuk, Peter Nguyen, Christopher Rathje, Graham Hornig, Haille Sharum, James Hoffman, Mark Freeman, and Frank Hegmann

https://www.osapublishing.org/abstract.cfm?uri=FiO-2016-FF3F.2

We demonstrate that THz-STM can probe single atoms on a silicon surface with simultaneous sub-nm and sub-ps resolution. THz-STM is established as a new technique for exploring high-field nonequilibrium tunneling phenomena with single atom precision.
© 2016 OSA
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