A repository & source of cutting edge news about emerging terahertz technology, it's commercialization & innovations in THz devices, quality & process control, medical diagnostics, security, astronomy, communications, applications in graphene, metamaterials, CMOS, compressive sensing, 3d printing, and the Internet of Nanothings. NOTHING POSTED IS INVESTMENT ADVICE! REPOSTED COPYRIGHT IS FOR EDUCATIONAL USE.
Showing posts with label DotFive project. Show all posts
Showing posts with label DotFive project. Show all posts
Monday, June 18, 2012
Monday, February 13, 2012
Focus on DotFive
http://www.dotfive.eu/index.php?id=18
The concept of the DOTFIVE project stems from the competitive race existing in semiconductor research to achieve individual devices and integrated circuits with higher operating speed allowing realization of new applications in new regions of the electromagnetic spectrum.
Applications in the emerging high-frequency (h.f.) markets more and more use SiGe components for cost reasons. Current state-of-the-art research and development is taking place primarily in data communication and radar systems at 24, 60, and 77 GHz [Floy06, Kata07, Haji05]. For instance, IBM has just demonstrated that its state-of-the-art SiGe HBT technology has the potential to play a major role in high-volume consumer electronic markets by proving the feasibility of 2-Gbps uncompressed HDTV transmission over a 60-GHz SiGe HBT radio link [Kata07, Pfei06a, Floy06].
The main objective of the DOTFIVE project is to demonstrate the realization of SiGe Heterojunction Bipolar Transistors (HBTs) operating at a maximum frequency close to 0.5 THz (500 GHz) at room temperature, and evaluate the achievable performance of integrated mmWave circuits using those HBTs. Further important objectives are: 0
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The main drawbacks in existing designs, which operate typically at frequencies up to a third of the transit frequency fT, are the necessary high bias currents leading to a power dissipation of several watts per radar chip and a limited achievable noise figure (NF) in each building block. The former disadvantage results in additional cooling effort, which implies costly packaging and mounting procedures. The latter directly influences the overall performance, as the total signal-to-noise ratio (SNR) in homodyne systems is directly limited by the NF of the (active) mixer. Thus, technologies with higher fT can directly lead to improved automotive radar systems with higher performance at lower power consumption, which increases road safety and energy budget. With an increased fT completely new and highly integrated microwave sensor systems are feasible.
However, until recently, this spectral region has resisted attempts to broadly harness its potential for everyday applications. This led to the expression THz gap, loosely describing the lack of adequate technologies to effectively bridge this transition region between microwaves and optics, both readily accessible via well developed electronic and laser-based approaches. THz technology is an emerging field which has demonstrated a wide-ranging potential. Extensive research in the last years has identified many attractive application areas and has paved the technological path towards broadly usable THz systems. THz technology is currently in a pivotal phase and will soon be in a position to radically expand our analytic capabilities via its intrinsic benefits. In this context, DOTFIVE is planned to establish the basis for fully integrated cost efficient electronic THz solutions.
Figure 1: Illustration of some exemplary applications of Terahertz radiation.
P. de Maagt, P. Haring Bolivar and C. Mann, Terahertz science, engineering and systems-from space to earth applications, Encyclopedia of RF and Microwave Engineering, Ed. by K. Chang, pp. 5175-5194 (John Wiley & Sons, Inc., 2005) ISBN 0-471-27053-
P. de Maagt, P. Haring Bolivar and C. Mann, Terahertz science, engineering and systems-from space to earth applications, Encyclopedia of RF and Microwave Engineering, Ed. by K. Chang, pp. 5175-5194 (John Wiley & Sons, Inc., 2005) ISBN 0-471-27053-
The scientific aspects of the DOTFIVE project are tackled by the work packages (WPs) 1 to 5 during a period of 36 months.
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WP1 is dedicated to “TCAD & physics-based predictive modeling” using Technology Computer Aided Design (TCAD) tools, which allow the simulation of processing steps and electrical characteristics of devices.
WP1 will support continuously the technology development in WP2 and WP3 by, e.g., assessing the achievable performance limits, identifying the critical limitations, and exploring new device concepts and architectures. WP1 will investigate the ultimate limits of SiGe HBT technology in terms of device performance, transport limits, quantum effects, and safe operation area limitations.
Partners involved: UN, ST SA, IMEC, IMS, BU, GWT
WP1 will support continuously the technology development in WP2 and WP3 by, e.g., assessing the achievable performance limits, identifying the critical limitations, and exploring new device concepts and architectures. WP1 will investigate the ultimate limits of SiGe HBT technology in terms of device performance, transport limits, quantum effects, and safe operation area limitations.
Partners involved: UN, ST SA, IMEC, IMS, BU, GWT
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WP2 is dedicated to “evolutionary SiGe HBT technology”. The work in WP2 will be based on state-of-the-art double-polysilicon self-aligned HBT architecture with selectively deposited SiGeC base. The objective of WP2 is to improve the performance of this technology towards the demanding DOTFIVE targets, such as 500 GHz maximum oscillation frequency and 2.5 ps gate delay.
Partners involved:ST SA, ST SAS, IFX
Partners involved:ST SA, ST SAS, IFX
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WP3 is dedicated to “advanced and novel SiGe HBT process modules and architectures”. Next to the evolutionary scaling of self-aligned selective epitaxial base HBTs in WP2, advanced and possibly revolutionary process modules are further developed and characterized in WP3. Focus is on the development of device architectures that have shown promising initial results.
Partners involved:IMEC, IHP
Partners involved:IMEC, IHP
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WP4 is dedicated to “compact modeling and device characterization”. This work package is in charge of setting up the methodology to accurately characterize transistors and to provide models that are valid and usable for circuit design all the way to 500 GHz.
Partners involved:ST SA, IFX, TUD, UN, UPS, XMOD, GWT
Partners involved:ST SA, IFX, TUD, UN, UPS, XMOD, GWT
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WP5 is dedicated to “application and technology benchmarking”. The objective of the work package is to direct the advanced process development and modeling (WP1,2,3) towards the next-generation of mmWave and THz applications through benchmarking and verifiable prototyping.
Partners involved:IFX, IMS, UoS, JKU, UoW
Partners involved:IFX, IMS, UoS, JKU, UoW
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WP6 is dedicated to the training and dissemination of the DOTFIVE results.
Partners involved:IMEC, ALMA, IFX, IHP, IMS, XMOD
Partners involved:IMEC, ALMA, IFX, IHP, IMS, XMOD
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Thursday, November 10, 2011
European researchers drive semiconductor technology for enhanced Terahertz imaging
http://cordis.europa.eu/fetch?CALLER=EN_NEWS_FP7&ACTION=D&DOC=1&CAT=NEWS&QUERY=01338e474e9a:9749:246581ed&RCN=34016Europeans continue to rise to the challenge of advancing communication, imaging and radar integrated circuits (IC) to work at high frequencies. A case in point is a team at Interuniversitair Micro-Electronica Centrum Vzw (imec) in Belgium; they recently presented the device 'fT/fMAX 245/450 GHz SiGe:C heterojunction bipolar transistor (HBT)'. This sophisticated device will help facilitate future high-volume millimetre-wave low-power circuits to be used in automotive radar applications. The study was funded in part by the DOTFIVE ('Towards 0.5 terahertz silicon/germanium hetero-junction bipolar technology') project, which received EUR 9.7 million under the 'Information and communication technologies' Theme of the EU's Seventh Framework Programme (FP7).
HBT devices are instrumental in helping silicon-based millimetre-wave circuits penetrate what is known as the terahertz (THz) gap. They enable enhanced imaging systems for security, medical and scientific applications, according to the researchers.
The team says the HBT devices are very fast and have a fully self-aligned architecture: self-alignment of the emitter, base and collector region. They can implement an optimised collector doping profile, they add. Where SiGe:C HBTs differ, in comparison with III-V-HBT devices, is that they combine high-density and low-cost integration. On account of this, they are better suited to consumer applications.
The researchers say these types of high-speed devices can also open up new application areas. They can work at very high frequencies with lower power dissipation, or with applications that require a reduced impact of process, and voltage and temperature variations at lower frequencies for better circuit reliability, the imec group said in a statement.
In order to secure the ultra-high speed requirements, sophisticated SiGe:C HBTs require additional upscaling of the device performance. For the most part, thin sub-collector doping profiles are considered a must for this upscaling. The collector dopants are typically introduced at the start of the processing and are therefore exposed to the complete thermal budget of the process flow. Because of this, the accurate positioning of the buried collector is harder to obtain.
In their statement, the imec researchers pointed out that performing in situ arsenic doping during the simultaneous growth of the sub-collector pedestal and the SiGe:C base allowed them to introduce both a thin, well-controlled, lowly doped collector region close to the base and a sharp transition to the highly doped collector, without further complicating the process.
This led to a significant increase in the overall HBT device performance: peak fMAX values above 450 GHz are obtained on devices with a high early voltage, a BVCEO of 1.7 V and a sharp transition from the saturation to the active region in the IC-VCE output curve. According to the researchers, the collector-base capacitance values did not rise much even though they performed aggressive scaling of the sub-collector doping profile. They said the current gain is well defined, with an average around 400; the emitter-base tunnel current, visible at low VBE values, is limited as well.
The DOTFIVE project, which is headed by the STMicroelectronics SA group of France, brought together researchers and industry players from Belgium, Germany, France and Italy.
HBT devices are instrumental in helping silicon-based millimetre-wave circuits penetrate what is known as the terahertz (THz) gap. They enable enhanced imaging systems for security, medical and scientific applications, according to the researchers.
The team says the HBT devices are very fast and have a fully self-aligned architecture: self-alignment of the emitter, base and collector region. They can implement an optimised collector doping profile, they add. Where SiGe:C HBTs differ, in comparison with III-V-HBT devices, is that they combine high-density and low-cost integration. On account of this, they are better suited to consumer applications.
The researchers say these types of high-speed devices can also open up new application areas. They can work at very high frequencies with lower power dissipation, or with applications that require a reduced impact of process, and voltage and temperature variations at lower frequencies for better circuit reliability, the imec group said in a statement.
In order to secure the ultra-high speed requirements, sophisticated SiGe:C HBTs require additional upscaling of the device performance. For the most part, thin sub-collector doping profiles are considered a must for this upscaling. The collector dopants are typically introduced at the start of the processing and are therefore exposed to the complete thermal budget of the process flow. Because of this, the accurate positioning of the buried collector is harder to obtain.
In their statement, the imec researchers pointed out that performing in situ arsenic doping during the simultaneous growth of the sub-collector pedestal and the SiGe:C base allowed them to introduce both a thin, well-controlled, lowly doped collector region close to the base and a sharp transition to the highly doped collector, without further complicating the process.
This led to a significant increase in the overall HBT device performance: peak fMAX values above 450 GHz are obtained on devices with a high early voltage, a BVCEO of 1.7 V and a sharp transition from the saturation to the active region in the IC-VCE output curve. According to the researchers, the collector-base capacitance values did not rise much even though they performed aggressive scaling of the sub-collector doping profile. They said the current gain is well defined, with an average around 400; the emitter-base tunnel current, visible at low VBE values, is limited as well.
The DOTFIVE project, which is headed by the STMicroelectronics SA group of France, brought together researchers and industry players from Belgium, Germany, France and Italy.
For more information, please visit:
imec:
http://www2.imec.be/be_en/home.html
DOTFIVE:
http://www.dotfive.eu/
imec:
http://www2.imec.be/be_en/home.html
DOTFIVE:
http://www.dotfive.eu/
Wednesday, October 26, 2011
DOTFIVE predicts automotive radar and WLAN applications for Terahertz
Emerging high-volume millimeter wave applications encompass, for example, 77 GHz automotive radar applications and 60 GHz WLAN (Wireless Local Area Network) communication systems. According to U.S.market research company Strategy Analysts, the market for long-range anti-collision warning systems in cars could increase by more than 65 percent per year until 2011. In addition to these already evolving markets, DOTFIVE technology sets out to be a key enabler for silicon-based millimeter wave circuits penetrating the so-called THz gap, enabling enhanced imaging systems with applications in the security, medical and scientific area.
See the results for each WP : http://www.dotfive.eu/index.php?id=69
Thursday, February 24, 2011
The European Union's DotFive project sets record and aims to reduce cost of Terahertz devices
http://www.eetimes.com/electronics-news/4213481/Consortium-claims-SiGe-frequency-record
Consortium claims SiGe frequency record
R. Colin Johnson
2/24/2011 9:31 AM EST
PORTLAND, Ore. –The European Union's DotFive project has produced a silicon germanium chip set that it claims has the world's highest frequency of operation in the history silicon germanium (SiGe) history. The 820 GHz (0.82 terahertz) transmitter and receiver chip pair enable x-ray-like vision—to see inside containers—but at harmless millimeter wavelengths.
Today's terahertz imaging, radar and communications applications require expensive exotic devices, but the EU's DotFive project aims to lower the cost of terahertz devices by casting them in high-frequency SiGe. The three-year-old project is focused on producing millimeter wavelength silicon-germanium hetero-junction bipolar transistors (BiCMOS), which will be produced by commercially by STMicroelectronics NV and Infineon Technologies AG.
At the International Solid-State Circuits Conference, IHP GmbH and the University of Wuppertal presented the latest results of the DotFive project. The team described its two chip set—transmitter and receiver—which includes all the frequency multipliers, harmonic mixers, power amplifiers, on-chip antennas, and other circuits needed to create 820 GHz frequencies from a 18GHz reference. The researchers demonstrated the chips in a THz imaging application that could see inside a USB memory stick.

The DotFive project is led by STMicro (Geneva), Infineon (Munich, Germany), XMOD Technologies (Talence, France), GWT-TUD GmbH (Dresden, Germany) along with research institutes IMEC (Leuven, Belgium) and IHP (Germany) and academic partners at the Johannes Kepler University of Linz (Austria), the Bordeaux National School of Electronics, IT and Radiocommunications, the Paris-Sud University (France), the Technical University of Dresden, the Bundeswehr University in Munich, the University of Siegen (Germany) and the University of Naples (Italy).

Today's terahertz imaging, radar and communications applications require expensive exotic devices, but the EU's DotFive project aims to lower the cost of terahertz devices by casting them in high-frequency SiGe. The three-year-old project is focused on producing millimeter wavelength silicon-germanium hetero-junction bipolar transistors (BiCMOS), which will be produced by commercially by STMicroelectronics NV and Infineon Technologies AG.
At the International Solid-State Circuits Conference, IHP GmbH and the University of Wuppertal presented the latest results of the DotFive project. The team described its two chip set—transmitter and receiver—which includes all the frequency multipliers, harmonic mixers, power amplifiers, on-chip antennas, and other circuits needed to create 820 GHz frequencies from a 18GHz reference. The researchers demonstrated the chips in a THz imaging application that could see inside a USB memory stick.
Visual images (top) and x-ray-like terahertz images (below) of objects screened at 0.82 THz with an integrated SiGe solution. Source: DotFive
The DotFive project is led by STMicro (Geneva), Infineon (Munich, Germany), XMOD Technologies (Talence, France), GWT-TUD GmbH (Dresden, Germany) along with research institutes IMEC (Leuven, Belgium) and IHP (Germany) and academic partners at the Johannes Kepler University of Linz (Austria), the Bordeaux National School of Electronics, IT and Radiocommunications, the Paris-Sud University (France), the Technical University of Dresden, the Bundeswehr University in Munich, the University of Siegen (Germany) and the University of Naples (Italy).
Chip micrographs of a fully-integrated SiGe chip-set for THz imaging applications, to be presented at the 2011 ISSCC. Source: DotFive
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