Showing posts with label Thomas Unold. Show all posts
Showing posts with label Thomas Unold. Show all posts

Saturday, October 6, 2018

Abstract-Minority and Majority Charge Carrier Mobility in Cu2ZnSnSe4 revealed by Terahertz Spectroscopy


Hannes Hempel, Charles J. Hages, Rainer Eichberger, Ingrid Repins, Thomas Unold




https://www.nature.com/articles/s41598-018-32695-6

The mobilities of electrons and holes determine the applicability of any semiconductor, but their individual measurement remains a major challenge. Here, we show that time-resolved terahertz spectroscopy (TRTS) can distinguish the mobilities of minority and majority charge carriers independently of the doping-type and without electrical contacts. To this end, we combine the well-established determination of the sum of electron and hole mobilities from photo-induced THz absorption spectra with mobility-dependent ambipolar modeling of TRTS transients. The method is demonstrated on a polycrystalline Cu2ZnSnSe4 thin film and reveals a minority (electron) mobility of 128 cm2/V-s and a majority (hole) carrier mobility of 7 cm2/V-s in the vertical transport direction relevant for light emitting, photovoltaic and solar water splitting devices. Additionally, the TRTS analysis yields an effective bulk carrier lifetime of 4.4 ns, a surface recombination velocity of 6 * 104 cm/s and a doping concentration of ca. 1016 cm−3, thus offering the potential for contactless screen novel optoelectronic materials.

Sunday, October 22, 2017

Abstract-Influence of structure geometry on THz emission from Black Silicon surfaces fabricated by reactive ion etching




Ulrike Blumröder, Matthias Zilk, Hannes Hempel, Patrick Hoyer, Thomas Pertsch, Rainer Eichberger, Thomas Unold, and Stefan Nolte

https://www.osapublishing.org/oe/abstract.cfm?uri=oe-25-6-6604&origin=search

The influence of structure geometry on THz emission from Black Silicon (BS) surfaces fabricated by reactive ion etching (RIE) has been investigated by a comprehensive study including optical simulations, optical-pump THz probe and THz emission studies. A strong enhancement of THz emission is observed with increasing structure depth, which is mainly related to the increased number of carriers created within the silicon needles and not due to the overall absorption enhancement as previously claimed for silicon nanowires.
© 2017 Optical Society of America