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Showing posts with label Tao Yang. Show all posts
Showing posts with label Tao Yang. Show all posts
Thursday, June 8, 2017
Abstract-THz Wave Modulator Based on the Decay of THz Surface Plasmon along an Intrinsic InSb Surface
Tao Yang, Bing Jiang, Ho-pui Ho, Yong-yuan Zhu, Wei Huang
http://iopscience.iop.org/article/10.1088/1742-6596/844/1/012038
THz surface plasmon are decayed exponentially when propagating along the surface of a semiconductor. A metal razor blade is used to couple THz surface plasmon to THz waves at different position on the surface of an indium antimonide wafer. Thus the intensity of the output THz wave is modulated.
Saturday, May 14, 2016
Abstract-Detection of defects on the surface of a semiconductor by terahertz surface plasmon polaritons
Tao Yang, Yuanyi Li, Rayko Stantchev, Yongyuan Zhu, Yiqiang Qin, Xinhui Zhou, and Wei Huang
https://www.osapublishing.org/ao/abstract.cfm?uri=ao-55-15-4139
We propose a new method for detecting small defects on the surface of a semiconductor by analyzing the transmission spectrum of terahertz surface plasmon polaritons. The field distributions caused by the detection of defects of different sizes are simulated. Experimentally, using a terahertz time domain spectrometer, we measure the transmission spectrum of terahertz surface plasmon polaritons passing through particles on the surface of an intrinsic InSb wafer. Our results show that the measured temporal waveform and frequency spectra are distinctly changed due to the presence of the particles, thereby confirming the effectiveness of this method for detecting defects. For increased detection efficiency, the frequency of the surface plasmon polaritons has to be slightly lower than the plasma frequency of the semiconductor. In comparison with traditional methods, our approach offers the merits of detecting both on-surface and subsurface defects, which is critical in monitoring the quality of semiconductor wafers.
© 2016 Optical Society of America
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