J. Phys. Chem. C, Just Accepted Manuscript
DOI: 10.1021/acs.jpcc.6b10580
Publication Date (Web): January 11, 2017
Copyright © 2017 American Chemical Society
Graphene oxide (GO) is an attractive option for large scale production of graphene. On the other hand, the graphene obtained by the reduction of GO has inevitable structural defects, and the vacant lattice sites will significantly restrict its conductivity. It has been demonstrated that thermal annealing in hydrogen is an efficient method to reduce defects and heal the lattice in GO samples. However, it is still not clear that how the defects and/or disordering influence on the photoelectric conversion efficiency and the carrier relaxation pathway in GO. Herein, the time-domain terahertz (THz) spectroscopy is employed to characterize the properties of the multilayer GO films which were annealed in hydrogen at various temperatures. Upon photo excitation, a transient increase of the conductivity was observed for the reduced graphene oxide (RGO) samples. The ultrafast carrier relaxation process can be well assigned to the carrier-carrier scattering and carrier-phonon coupling. Our results demonstrated that the RGO films with fewer defects and better lattice structure is successfully manufactured. In addition, by fitting to the Drude model, several electron transport parameters, such as the carrier scattering time, carrier plasma frequency and photoinduced conductivity, are obtained in our multilayer RGO films.
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